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The effects of silicon, nitrogen and oxygen incorporation and oxygen-scavenging technique on performances of hafnium-based gate dielectric MOSFETs

Thesis (Ph. D.)--University of Texas at Austin, 2006. / Vita. Includes bibliographical references.

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/72482069
Date January 1900
CreatorsChoi, Changhwan.
Publisher[Austin, Tex. : University of Texas Libraries,
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish

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