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Development of a deep-submicron CMOS process for fabrication of high performance 0.25 um [micron] transistors /

Thesis (M.S.)--Rochester Institute of Technology, 2006. / Typescript. Includes bibliographical references (leaves 144-146).

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/73482280
Date January 2006
CreatorsAquilino, Michael V.
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish
SourceOnline version of thesis

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