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Trapping of hydrogen in Hf-based high [kappa] dielectric thin films for advanced CMOS applications

Thesis (Ph. D.)--University of North Texas, Dec., 2007. / Title from title page display. Includes bibliographical references.

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/231334498
Date January 2007
CreatorsUkirde, Vaishali. El Bouanani, Mohamed,
Publisher[Denton, Tex.] : University of North Texas,
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish
Sourceconnect to online resource.

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