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The effect of structural variations on the lithographic performance of the poly(chloromethylstyrene-co-methylstyrene) resist system

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1. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.381679

Identifer	oai:union.ndltd.org:bl.uk/oai:ethos.bl.uk:381679
Date	January 1988
Creators	Griffiths, L. G.
Publisher	University of Kent
Source Sets	Ethos UK
Detected Language	English
Type	Electronic Thesis or Dissertation