New composite material based on silsesquioxane polymers and nanoporous particles for low-k [low-kappa] dielectric application

Description

München, Techn. University, Diss., 2004.

Links & Downloads

1. http://deposit.ddb.de/cgi-bin/dokserv?idn=972240519
2. http://tumb1.biblio.tu-muenchen.de/publ/diss/ch/2004/su.pdf
3. http://tumb1.biblio.tu-muenchen.de/publ/diss/ch/2004/su.html

Tags

Mikroelektronik

Additional Fields

Identifer	oai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/76505853
Date	January 2004
Creators	Su, Ruo Qing.
Publisher	[S.l. : s.n.],
Source Sets	OCLC
Language	English
Detected Language	English
Source	LF