Rational development of precursors for MOCVD of TiO2: precursor chemistry, thin film deposition, mechanistic studies

Description

Bochum, University, Diss., 2005.

Links & Downloads

1. http://www-brs.ub.ruhr-uni-bochum.de/netahtml/HSS/Diss/BhaktaRaghunandanKrishna/diss.pdf
2. http://www-brs.ub.ruhr-uni-bochum.de/netahtml/HSS/Diss/BhaktaRaghunandanKrishna/
3. http://deposit.ddb.de/cgi-bin/dokserv?idn=975799681

Tags

MOCVD-Verfahren

Additional Fields

Identifer	oai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/76778450
Date	January 2005
Creators	Bhakta, Raghunandan Krishna.
Publisher	[S.l. : s.n.],
Source Sets	OCLC
Language	English
Detected Language	English
Source	LF