This study investigates sub 200nm half-pitch polymer structures by nanoimprint process. The trench structures were fabricated on quartz glass with various depths and widths by FIB. To investigate the best nanoimprint process on SU-8, we studied various parameters such as: imprinting temperature, imprinting pressure, and temperature for de-molding, etc. ¡@This study had successfully defined 50nm width with different depths on to SU-8 by imprint. ¡@Imprint temperature above Tg 30¢J with constant pressure on continuous impressing and de-mold in room temperature would result in better imprinting results. The filling rate of this nanoimprint technology was measured by atomic force microscopy. ¡@For structures above/near 100nm half-pitch, the filling rate is nearly 100%.
| Identifer | oai:union.ndltd.org:NSYSU/oai:NSYSU:etd-0815108-145431 |
| Date | 15 August 2008 |
| Creators | Fan, Chen-Yi |
| Contributors | Lee, Ming-San, Chao,Chien-Hsiang, Pan, Cheng-Tang, Tsai, Nan-Chyuan |
| Publisher | NSYSU |
| Source Sets | NSYSU Electronic Thesis and Dissertation Archive |
| Language | Cholon |
| Detected Language | English |
| Type | text |
| Format | application/pdf |
| Source | http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0815108-145431 |
| Rights | withheld, Copyright information available at source archive |
Page generated in 0.0015 seconds