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Study on anti-adhesion layer of nanoimprint

In this study, it was nanoimprint focused on the anti-adhesion technique between the grating structure silicon molds below 200nm half-pitch and polymer materials (H-PDMS). The nano-groove structure molds with different depths and widths were made by FIB. During the process of molding by soft-lithography, an anti-adhesion layer needed being plated between the silicon and PDMS mold, which was in order to get completely formed H-PDMS soft mold and prevent defective mold caused by the adhesion problem on the surface. There were three kinds of method of plating anti-adhesion layer which were the liquid immersion, vapor deposition, and fluorine doped DLC film. The PFOTCS was used as mold releasing agent in the methods of liquid immersion and vapor deposition, and the contact angle was measured to realize the ability of anti-adhesion. In the method of fluorine doped DLC film, in addition to measuring the anti-adhesion ability for each sample through contact angle with water, the AFM was also applied to measure the degree of adhesion on the surface for each film. And the contact angles with water between each film were also compared. The methods of plating anti-adhesion film with lower degree of adhesion on the surface could be acquired and discussed by means of the above-mentioned ways to fabricate the molds with good formability

Identiferoai:union.ndltd.org:NSYSU/oai:NSYSU:etd-0906110-141559
Date06 September 2010
CreatorsWang, Zhao-Kai
ContributorsYuan-Fang Chou, Cheng-Tang Pan, Chien-Hsiang Chao, Tai-Fa Yang
PublisherNSYSU
Source SetsNSYSU Electronic Thesis and Dissertation Archive
LanguageCholon
Detected LanguageEnglish
Typetext
Formatapplication/pdf
Sourcehttp://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0906110-141559
Rightsrestricted, Copyright information available at source archive

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