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Growth and Characterization of GaN Nanorods Grown on Si(111) Substrate by Plasma-assisted Molecular Beam Epitaxy

Nearly dislocation-free vertical GaN pillars in nanoscale were grown on Si (111) surface through self-assembly by molecular-beam epitaxy. No extra catalytic or nanostructural assistance has been employed. These nanorods have a lateral dimension from 10 nm to ~ 800 nm and a height of 50 nm to 3

Identiferoai:union.ndltd.org:NSYSU/oai:NSYSU:etd-1013104-163813
Date13 October 2004
CreatorsHsiao, Ching-Lien
Contributorsnone, none, none, none, none, none, Li-wei Tu, none
PublisherNSYSU
Source SetsNSYSU Electronic Thesis and Dissertation Archive
LanguageEnglish
Detected LanguageEnglish
Typetext
Formatapplication/pdf
Sourcehttp://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-1013104-163813
Rightsnot_available, Copyright information available at source archive

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