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Structural and field emission properties of ion beam synthesized metal-dielectric nano-composite thin films.

Yuen, Ying Kit. / Thesis (M.Phil.)--Chinese University of Hong Kong, 2007. / Includes bibliographical references (leaves 90-96). / Abstracts in English and Chinese. / Chapter Chapter 1 --- Introduction / Chapter 1.1 --- Introduction to Electron Field Emission --- p.1 / Chapter 1.2 --- Theory of Electron Field Emission --- p.4 / Chapter 1.3 --- Fowler Nordheim Model for Electron Field Emission in Metals --- p.5 / Chapter 1.4 --- Factors Affecting the Field Emission Properties --- p.7 / Chapter 1.4.1 --- Surface Morphology --- p.7 / Chapter 1.4.2 --- Electrical Inhomogeneity --- p.7 / Chapter 1.5 --- Goal of this Project --- p.9 / Chapter Chapter 2 --- Sample Preparation and Characterization Methods / Chapter 2.1 --- Sample Preparation --- p.11 / Chapter 2.1.1 --- MEVVA Ion Implantation System --- p.13 / Chapter 2.1.2 --- TRIM Simulation --- p.17 / Chapter 2.1.3 --- Implantation Conditions --- p.19 / Chapter 2.2 --- Characterization Methods --- p.21 / Chapter 2.2.1 --- AFM - Atomic Force Microscopy --- p.21 / Chapter 2.2.2 --- C-AFM ´ؤ Conducting Atomic Force Microscopy --- p.23 / Chapter 2.2.3 --- RBS - Rutherford Backscattering Spectrometry --- p.23 / Chapter 2.2.4 --- TEM - Transmission Electron Microscopy --- p.26 / Chapter 2.2.5 --- Field Emission Measurement --- p.27 / Chapter Chapter 3 --- Field Emission Properties of Co-Si02 / Chapter 3.1 --- Introduction --- p.29 / Chapter 3.2 --- RBS results --- p.30 / Chapter 3.3 --- Experimental results of as-implanted Co-SiO2 samples --- p.32 / Chapter 3.3.1 --- AFM and results --- p.32 / Chapter 3.3.2 --- Field emission properties of as-implanted Co-Si02 --- p.35 / Chapter 3.4 --- Step-like and jump-like features in the J-E plots --- p.39 / Chapter 3.5 --- Chapter Summary --- p.43 / Chapter Chapter 4 --- Field Emission Properties of Fe-SiO2 / Chapter 4.1 --- Introduction --- p.45 / Chapter 4.2 --- RBS results --- p.46 / Chapter 4.3 --- Experimental results of as-implanted Fe-SiO2 samples --- p.48 / Chapter 4.3.1 --- AFM and results --- p.48 / Chapter 4.3.2 --- Field emission properties of as-implanted Fe-SiO2 --- p.51 / Chapter 4.3.3 --- Comparison with as-implanted Co-SiO2 --- p.54 / Chapter 4.4 --- Experimental results of annealed Fe-SiO2 samples --- p.57 / Chapter 4.4.1 --- Annealing conditions --- p.57 / Chapter 4.4.2 --- AFM and C-AFM results --- p.57 / Chapter 4.4.3 --- TEM Images --- p.62 / Chapter 4.4.4 --- Field emission properties of annealed Fe-SiO2 --- p.68 / Chapter 4.5 --- Step-like and jump-like features in the J-E plots --- p.81 / Chapter 4.6 --- Field Emission Images --- p.84 / Chapter 4.7 --- Chapter Summary --- p.85 / Chapter Chapter 5 --- Conclusion & Future Plan --- p.87 / Reference --- p.90 / Appendix / Chapter A. --- Derivation of the Fowler Nordheim Equation --- p.97

Identiferoai:union.ndltd.org:cuhk.edu.hk/oai:cuhk-dr:cuhk_326152
Date January 2007
ContributorsYuen, Ying Kit., Chinese University of Hong Kong Graduate School. Division of Electronic Engineering.
Source SetsThe Chinese University of Hong Kong
LanguageEnglish, Chinese
Detected LanguageEnglish
TypeText, bibliography
Formatprint, xii, 105 leaves : ill. ; 30 cm.
RightsUse of this resource is governed by the terms and conditions of the Creative Commons “Attribution-NonCommercial-NoDerivatives 4.0 International” License (http://creativecommons.org/licenses/by-nc-nd/4.0/)

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