Effect of fluid dynamics and reactor design on the epitaxial growth of gallium nitride on silicon substrate by metalorganic chemical vapor deposition

Description

Thesis (Ph. D.)--Ohio University, March, 2000. / Title from PDF t.p.

Links & Downloads

1. http://www.ohiolink.edu/etd/view.cgi?ohiou1179171265

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Additional Fields

Identifer	oai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/225900570
Date	January 2000
Creators	Gao, Yungeng.
Publisher	Ohio : Ohio University,
Source Sets	OCLC
Language	English
Detected Language	English
Source	Connect to resource online