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In-situ and post-growth investigation of low temperature Group III-nitride thin films deposited via MOCVD /

Thesis (Ph. D.)--University of Washington, 2001. / Vita. Includes bibliographical references (leaves 168-180).

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/48175062
Date January 2001
CreatorsJohnson, Michael Christopher.
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish
TypeTheses
SourceConnect to this title online; UW restricted

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