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Some electronic properties of thin dielectric oxide films containing cerium, niobium, vanadium and silicon

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1. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.384096

Identifer	oai:union.ndltd.org:bl.uk/oai:ethos.bl.uk:384096
Date	January 1988
Creators	Mian, A. R.
Publisher	Brunel University
Source Sets	Ethos UK
Detected Language	English
Type	Electronic Thesis or Dissertation