Xu Yan = 納米銅(銅的氧化物)與三氧化二鋁復合物薄膜的製備和特性研究 / 許燕. / Thesis (M.Phil.)--Chinese University of Hong Kong, 2003. / Includes bibliographical references (leaves 50-51). / Text in English; abstracts in English and Chinese. / Xu Yan = Na mi tong (tong de yang hua wu) yu san yang hua er lv fu he wu bo mo de zhi bei he te xing yan jiu / Xu Yan. / Abstract --- p.i / 摘要 --- p.ii / Acknowledgements --- p.iii / Table of Contents --- p.iv / List of Figures --- p.viii / List of Tables --- p.xi / Chapter CHAPTER 1 --- Introduction / Chapter 1.1 --- Nanostructured Materials --- p.1 / Chapter 1.2 --- Objective of this Work --- p.1 / Chapter CHAPTER 2 --- Background / Chapter 2.1 --- Correlation of AES-CuLMM spectrum and Cu nanocluster size --- p.3 / Chapter 2.1.1 --- Typical AES-CuLMM spectra --- p.3 / Chapter 2.1.2 --- A simplified model --- p.4 / Chapter 2.1.3 --- correlation of AES-CuLMM spectra and the simplified model --- p.4 / Chapter 2.2 --- Previous works --- p.5 / Chapter CHAPTER 3 --- Instrumentation / Chapter 3.1 --- Sputtering --- p.6 / Chapter 3.1.1 --- Principles of sputtering --- p.6 / Chapter 3.1.1.1 --- Concepts of sputtering --- p.6 / Chapter 3.1.1.2 --- Initiating the plasma --- p.8 / Chapter 3.1.1.3 --- Depositing a film onto the substrate --- p.8 / Chapter 3.1.2 --- Radio-frequency (RF) magnetron sputtering --- p.9 / Chapter 3.1.2.1 --- RF sputtering --- p.9 / Chapter 3.1.2.2 --- Magnetron Sputtering --- p.10 / Chapter 3.2 --- Deposition system --- p.10 / Chapter 3.2.1 --- Instrumentation --- p.11 / Chapter 3.2.1.1 --- Vacuum system --- p.11 / Chapter 3.2.1.2 --- Sputter target and power supplies --- p.12 / Chapter 3.2.1.3 --- Substrate mounting --- p.13 / Chapter 3.2.2 --- Experimental --- p.13 / Chapter 3.3 --- X-ray Photoelectron Spectroscopy (XPS) --- p.14 / Chapter 3.3.1 --- Basic Principles --- p.14 / Chapter 3.3.2 --- Instrumentation --- p.17 / Chapter 3.3.3 --- Qualitative and quantitative analysis --- p.17 / Chapter 3.3.3.1 --- Spectra interpretations --- p.17 / Chapter 3.3.3.2 --- X-ray emission line width --- p.18 / Chapter 3.3.3.3 --- Qualification --- p.18 / Chapter 3.3.3.3.1 --- Chemical composition --- p.18 / Chapter 3.3.3.3.2 --- Sputter depth profiling --- p.18 / Chapter 3.3.3.3.3 --- Auger parameter --- p.19 / Chapter 3.4 --- Transmission Electron Microscopy (TEM) --- p.19 / Chapter 3.4.1 --- An overview of TEM --- p.19 / Chapter 3.4.2 --- Imaging mode and diffraction mode --- p.21 / Chapter 3.4.3 --- Electron-Specimen interactions --- p.21 / Chapter 3.4.3.1 --- Elastic scattering --- p.22 / Chapter 3.4.3.2 --- Inelastic scattering --- p.22 / Chapter 3.4.4 --- Imaging mechanisms for TEM --- p.23 / Chapter 3.4.4.1 --- Mass-thickness contrast --- p.23 / Chapter 3.4.4.2 --- Diffraction contrast --- p.23 / Chapter 3.4.5 --- TEM sample preparation --- p.25 / Chapter CHAPTER 4 --- Chemical and Structure Characterization of Cu(CuOx)/Al2O3 Composite Thin Films / Chapter 4.1 --- Overview --- p.26 / Chapter 4.2 --- Results and discussions --- p.26 / Chapter 4.2.1 --- Set I: Achieving the stoichiometry of A1203 matrix --- p.26 / Chapter 4.2.2 --- Set II: keeping A1203 stoichiometry and studying on the correlation of CuLMM spectra and average Cu cluster size --- p.32 / Chapter 4.2.2.1 --- Chemical information obtained by XPS --- p.32 / Chapter 4.2.2.2 --- Nanostructure studied by TEM --- p.38 / Chapter 4.2.2.3 --- Mechanical properties inspected by nano-indentation --- p.43 / Chapter 4.2.2.4 --- Optical properties --- p.43 / Chapter 4.2.3 --- Set III: Duration of deposition --- p.44 / Chapter 4.2.4 --- Set VI: Pressure effect on the average size of Cu nanoclusters --- p.45 / Chapter CHAPTER 5 --- Conclusions --- p.48 / References --- p.50
| Identifer | oai:union.ndltd.org:cuhk.edu.hk/oai:cuhk-dr:cuhk_324237 |
| Date | January 2003 |
| Contributors | Xu, Yan., Chinese University of Hong Kong Graduate School. Division of Physics. |
| Source Sets | The Chinese University of Hong Kong |
| Language | English, Chinese |
| Detected Language | English |
| Type | Text, bibliography |
| Format | print, xi, 51 leaves : ill. ; 30 cm. |
| Rights | Use of this resource is governed by the terms and conditions of the Creative Commons “Attribution-NonCommercial-NoDerivatives 4.0 International” License (http://creativecommons.org/licenses/by-nc-nd/4.0/) |
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