This work deals with deposition of yttrium oxide layers on silicon substrate (P – type) by using magnetron and reactive magnetron sputtering. Experiments which were made are further described. After that, work is focused on evaluation of deposited layers by using FTIR measurement technique and spectrophotometry. At the end of the work results of experiments are discussed also with the future progress.
| Identifer | oai:union.ndltd.org:nusl.cz/oai:invenio.nusl.cz:218813 |
| Date | January 2010 |
| Creators | Dostál, Vladimír |
| Contributors | Boušek, Jaroslav, Hégr, Ondřej |
| Publisher | Vysoké učení technické v Brně. Fakulta elektrotechniky a komunikačních technologií |
| Source Sets | Czech ETDs |
| Language | Czech |
| Detected Language | English |
| Type | info:eu-repo/semantics/masterThesis |
| Rights | info:eu-repo/semantics/restrictedAccess |
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