Molecular beam deposition (MBD) and characterisation of high-k material as alternative gate oxides for MOS-technology

Description

München, University der Bundeswehr, Diss., 2005.

Links & Downloads

1. http://deposit.d-nb.de/cgi-bin/dokserv?idn=982288042
2. http://ub.unibw-muenchen.de/dissertationen/ediss/capodieci-vanessa/inhalt.pdf
3. http://137.193.200.177/ediss/capodieci-vanessa/meta.html

Tags

Additional Fields

Identifer	oai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/182778362
Creators	Capodieci, Vanessa.
Source Sets	OCLC
Language	English
Detected Language	English
Source	kostenfrei