An evaluation of the electrical, material, and reliability characteristics and process viability of ZrO₂ and ZrOxNy for future generation MOS gate dielectric

Description

Thesis (Ph. D.)--University of Texas at Austin, 2002. / Vita. Includes bibliographical references. Available also from UMI Company.

Links & Downloads

1. http://repositories.lib.utexas.edu/bitstream/handle/2152/816/niehre026.pdf
2. http://wwwlib.umi.com/cr/utexas/fullcit?p3099506

Tags

Additional Fields

Identifer	oai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/56826922
Date	January 2002
Creators	Nieh, Renee Elizabeth.
Source Sets	OCLC
Language	English
Detected Language	English