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The microstructural effects of metallization and heat treatment on thin gate oxide for use in sub-micron MOSFETs /

Thesis (Ph. D.), Oregon Graduate Institute of Science & Technology, 1996.

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/35864519
Date January 1996
CreatorsMcCarthy, John M.,
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish
SourceFull text open access at:

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