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A study of thermally nitrided silicon dioxide thin films for metal-oxide-silicon VLSI techology /

Thesis (Ph. D.)--University of Hong Kong, 1990.

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/51344952
Date January 1990
CreatorsLiu, Zhihong.
Publisher[Hong Kong : University of Hong Kong],
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish
SourceView the Table of Contents & Abstract.

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