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Anisotropic acid catalyst displacement in a chemically amplified photoresist via application of an electric field /

Thesis (M.S.)--Rochester Institute of Technology, 2009. / Typescript. Includes bibliographical references (leaves 56-57).

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/567740694
Date January 2009
CreatorsJohnson, Ward A.
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish
SourceOnline version of thesis.

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