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Using local oxidation lithography to build mesoscopic structures

We use an atomic force microscope to perform nanolithography by local oxidation on two-dimensional electron gases. We study the oxidation process under different environmental conditions. It is found that oxide growth is hindered at high temperature and affected by ozone. These findings help us to understand the role of the water film present on the surface, and lead us to propose a mechanism that would avoid its widening effect. We develop a new lithography technique, diamond scribe scratching, and use it to make coarse mesoscopic structures. Then, we combine diamond scribe scratching and local oxidation to fabricate working mesoscopic structures, namely quantum point contacts.

Identiferoai:union.ndltd.org:LACETR/oai:collectionscanada.gc.ca:QMM.98744
Date January 2005
CreatorsLandry, Olivier.
PublisherMcGill University
Source SetsLibrary and Archives Canada ETDs Repository / Centre d'archives des thèses électroniques de Bibliothèque et Archives Canada
LanguageEnglish
Detected LanguageEnglish
TypeElectronic Thesis or Dissertation
Formatapplication/pdf
CoverageMaster of Science (Department of Physics.)
Rights© Olivier Landry, 2005
Relationalephsysno: 002494689, proquestno: AAIMR24714, Theses scanned by UMI/ProQuest.

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