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Reactive ion etching of polymide films using a radio frequency discharge /

Thesis (M.S.)--Rochester Institute of Technology, 1987. / Typescript. Includes bibliographical references (leaves 106-108).

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/25903913
Date January 1987
CreatorsFagan, James G.
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish
SourceOnline version of thesis

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