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Spectroscopic studies of the etching of Si and Al in Cl←2 and CCl←4 plasmas

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1. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.328037

Identifer	oai:union.ndltd.org:bl.uk/oai:ethos.bl.uk:328037
Date	January 1988
Creators	Clarke, Peter E.
Publisher	University of Bristol
Source Sets	Ethos UK
Detected Language	English
Type	Electronic Thesis or Dissertation