Etching of polyphenylene oxide in a downstream microwave plasma using NF₃, SF₆, O₂ and Ar gas mixtures

Description

Graduation date: 2005

Links & Downloads

1. http://hdl.handle.net/1957/29838

Tags

Plasma etching

Microwave plasmas

Additional Fields

Identifer	oai:union.ndltd.org:ORGSU/oai:ir.library.oregonstate.edu:1957/29838
Date	28 September 2004
Creators	Venkataraman, Arjun
Contributors	Koretsky, Milo D.
Source Sets	Oregon State University
Language	en_US
Detected Language	English
Type	Thesis/Dissertation