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Formation and characterization of high dose ion implanted thin layers of metal clusters embedded in silica glass.

by Chung Pui Shan. / Thesis (M.Phil.)--Chinese University of Hong Kong, 2001. / Includes bibliographical references (leaves 105-110). / Abstracts in English and Chinese. / Abstract --- p.i / Acknowledgements --- p.iii / Table of contents --- p.v / Chapter Chapter 1. --- Introduction --- p.1 / Chapter 1.1 --- Metal clusters embedded in fused silica glass --- p.2 / Chapter 1.2 --- Ion implantation of metal clusters --- p.3 / Chapter 1.3 --- Feature of MEVVA implantation --- p.5 / Chapter 1.4 --- Motivation and organization of this thesis --- p.7 / Chapter Chapter 2. --- Sample Preparation and Characterization Methods / Chapter 2.1 --- MEVVA implantation --- p.9 / Chapter 2.2 --- TRIM simulation --- p.11 / Chapter 2.3 --- Sample preparation --- p.14 / Chapter 2.4 --- Rutherford backscattering spectroscopy (RBS) --- p.16 / Chapter 2.5 --- X-ray diffraction (XRD) technique --- p.17 / Chapter 2.6 --- X-ray photoelectron spectroscopy (XPS) --- p.21 / Chapter 2.7 --- Transmission electron microscopy (TEM) technique --- p.24 / Chapter 2.8 --- Spectroscopic ellipsometry (S.E.) --- p.25 / Chapter 2.9 --- Z-scan technique --- p.32 / Chapter Chapter 3. --- Characterization of Single Implanted Samples / Chapter 3.1 --- Experimental results and discussion / Chapter 3.1.1 --- RBS --- p.35 / Chapter 3.1.2 --- XRD --- p.38 / Chapter 3.1.3 --- XPS --- p.42 / Chapter 3.1.4 --- XTEM --- p.49 / Chapter 3.1.5 --- S.E --- p.54 / Chapter 3.1.6 --- Z-scan measurements --- p.60 / Chapter 3.2 --- Summary --- p.65 / Chapter Chapter 4. --- Characterization of Sequentially Cu-Ni Implanted Samples / Chapter 4.1 --- Experimental results and discussion / Chapter 4.1.1 --- XRD --- p.66 / Chapter 4.1.2 --- XPS --- p.68 / Chapter 4.1.3 --- XTEM --- p.77 / Chapter 4.1.4 --- Z-scan measurements --- p.87 / Chapter 4.2 --- Summary --- p.91 / Chapter Chapter 5. --- Conclusion and Future Works / Chapter 5.1 --- Conclusion --- p.92 / Chapter 5.2 --- Future works --- p.93 / Appendix / Appendix I --- p.94 / Chapter ☆ --- Sample preparation procedures for XTEM / Appendix II --- p.97 / Chapter ☆ --- Alignment procedures of S.E. / Chapter ☆ --- Implementation of the Merlin system / Appendix III --- p.101 / Chapter ☆ --- Calibration of S.E. / Reference --- p.105

Identiferoai:union.ndltd.org:cuhk.edu.hk/oai:cuhk-dr:cuhk_323398
Date January 2001
ContributorsChung, Pui Shan., Chinese University of Hong Kong Graduate School. Division of Electronic Engineering.
Source SetsThe Chinese University of Hong Kong
LanguageEnglish, Chinese
Detected LanguageEnglish
TypeText, bibliography
Formatprint, vii, 110 leaves : ill. ; 30 cm.
RightsUse of this resource is governed by the terms and conditions of the Creative Commons “Attribution-NonCommercial-NoDerivatives 4.0 International” License (http://creativecommons.org/licenses/by-nc-nd/4.0/)

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