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The use of contour plots to optimize exposure and development time in the preparation of color correction masks with a three-aim-point control system /

Thesis (M.S.)--Rochester Institute of Technology, 1981. / Typescript. Includes bibliographical references (leaf 77).

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/25822533
Date January 1981
CreatorsIrwin, Ronald E.
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish
SourceOnline version of thesis

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