The standard Shewhart control chart for monitoring process stability is generalized by selecting a point in time at which the distance between the control limits is reduced. Three cost models are developed to describe the total cost per unit time of monitoring the mean of a process using both the standard and the generalized Shewhart control chart. The cost models are developed under the assumption that the quality characteristic of interest is normally distributed with known and constant variance. In the development of the first model, the negative exponential distribution is employed to model the time to process shift. Then, the uniform distribution and the Weibull distribution are used for the same purpose in the second and the third model, respectively. The motivation for this effort is to increase chart sensitivity to small but anticipated shifts in the process average.
Cost models are constructed to allow the optimal choice of change over time and the best values for the initial and adjusted control limit values. The cost models are analyzed to determine the optimal control chart parameters including those associated with both the standard and the generalized control chart. The models are also used to provide a comparison with conventional implementation of the control chart. It is shown that the proposed cost models are efficient and economical. Figures and tables are provided to aid in the design of models for both the standard and the generalized Shewhart control chart. / Ph. D.
Identifer | oai:union.ndltd.org:VTETD/oai:vtechworks.lib.vt.edu:10919/38288 |
Date | 06 June 2008 |
Creators | Zou, Xueli |
Contributors | Industrial and Systems Engineering, Nachlas, Joel A., Sherali, Hanif, Koelling, C. Patrick, Arnold, Jesse C., Beaton, Robert J. |
Publisher | Virginia Tech |
Source Sets | Virginia Tech Theses and Dissertation |
Language | English |
Detected Language | English |
Type | Dissertation, Text |
Format | ix, 168 leaves, BTD, application/pdf, application/pdf |
Rights | In Copyright, http://rightsstatements.org/vocab/InC/1.0/ |
Relation | OCLC# 30658942, LD5655.V856_1993.Z68.pdf |
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