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Depozice Ga a GaN nanostruktur na vodíkem modifikovaný grafenový substrát / Deposition of Ga and GaN nanostructures on graphene substrate treated by atomic hydrogen

In this work we studied gallium on graphene. Depositions were done by Molecular beam epitaxy. We observed Raman enhancement and peak shifts by individual Ga islands. Simulation confirmed our assumption, that the enhancement is based on plasmonics effect that is also the main contribution of Surface-enhanced Raman spectroscopy. Another result is hydrogenation of graphene before deposition does have an effect on Ga structure and reduces diffusion length of Ga atoms.

Identiferoai:union.ndltd.org:nusl.cz/oai:invenio.nusl.cz:254312
Date January 2016
CreatorsBárdy, Stanislav
ContributorsVáňa, Rostislav, Mach, Jindřich
PublisherVysoké učení technické v Brně. Fakulta strojního inženýrství
Source SetsCzech ETDs
LanguageCzech
Detected LanguageEnglish
Typeinfo:eu-repo/semantics/masterThesis
Rightsinfo:eu-repo/semantics/restrictedAccess

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