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Thermal annealing of Mo/Si multilayers to assess the stability relevant to soft x-ray projection lithography

Graduation date: 1993

Identiferoai:union.ndltd.org:ORGSU/oai:ir.library.oregonstate.edu:1957/36091
Date23 July 1992
CreatorsViliardos, Michael A.
ContributorsKassner, Michael E.
Source SetsOregon State University
Languageen_US
Detected LanguageEnglish
TypeThesis/Dissertation

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