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Applying loop-mirror reflector in the fabrication and design of Fabry-Perot laser

The purpose of this research is to present design and fabrication of resonant loop-mirror Fabry-Perot lasers. Single filter has simple fabrication processes and good potential for intergration. A 1.55-£gm symmetric quantum well InGaAlAs epi-layer wafer is used to fabricate the laser. In device design, we apply loop mirror to obtain reflection instead of cleaved facet and take 1x2, 2x2 Multi-Mode Interference (MMI) with different splitting ratio (50%:50%¡F15%:85%) as a coupler. Then we combine MMI couplers with ring cavities to reflect specific wavelength at particular position. Therefore we can obtain semiconductor laser with property of wavelength-selection filter.
In this design of the mask, we add a mask of deep-etch around MMI in order to decrease the loss of higher mode inside MMI. In the part of devices design, we apply multi-step technology for wet etch to obtain necessary depth. Finally, we use the etch solution (HBr¡GHCl¡GH2O2¡GH2O¡×5¡G4¡G1¡G70) to smooth the sidewall of the waveguide, and to reduce scattering loss of the device.
In the part of planarization, we can adhere dummy wafers to surround the main sample and extend the total area. If we can fill the gap flat, the problem of high edge by spinning will be solved. However, we were not able to fill the gap.

Identiferoai:union.ndltd.org:NSYSU/oai:NSYSU:etd-0710106-212102
Date10 July 2006
CreatorsLai, Chun-ming
ContributorsShoou-Jinn Chang, Tsong-Sheng Lay, Kuo-Jui Lin, Tao-Yuan Chang, Lung-Han Peng
PublisherNSYSU
Source SetsNSYSU Electronic Thesis and Dissertation Archive
LanguageCholon
Detected LanguageEnglish
Typetext
Formatapplication/pdf
Sourcehttp://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0710106-212102
Rightsnot_available, Copyright information available at source archive

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