This research presents grating photoresist structures by imprint and focused ion beam (FIB) techniques. Imprint technique is not limited to the physical properties of optical lithography. In the imprinting process, the quartz mold designed for imprinting process is fabricated by focused ion beam techniques to imprint photoresist (SU-8). To select imprint temperature of resist by Differential Scanning Calorimetry, and several kind of pressure are tested and evaluated for imprint. In this study, trichloro(1H, 1H, 2H, 2H- perfluorooctyl)silane (PFOTCS) are used for self-assembled monolayers (SAM) on mold as releasing and anti-sticking layer for nanoimprint. We use contact angle system to discuss the surface energy of any contact surface. The results demonstrated that the resist surface revealed the lower defect and roughness after separation of imprinting mold with SAMs of PFOTCS monolayer, ascribed to the PFOTCS monolayer with a large amount of -CF2 resulted in lower surface energy. This research has successfully defined 50~400 nm width resist features on the mold and transferred to the polymer after imprinting.
| Identifer | oai:union.ndltd.org:NSYSU/oai:NSYSU:etd-0717107-162749 |
| Date | 17 July 2007 |
| Creators | Sie, Dong-Rong |
| Contributors | Chien-Hsiang Chao, Che-Hsin Lin, Ming-San Lee, Cheng-Tang Pan |
| Publisher | NSYSU |
| Source Sets | NSYSU Electronic Thesis and Dissertation Archive |
| Language | Cholon |
| Detected Language | English |
| Type | text |
| Format | application/pdf |
| Source | http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0717107-162749 |
| Rights | not_available, Copyright information available at source archive |
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