Miniaturization has become a product trend due to technological advancements, thus giving rise to nanoimprint lithography printing. Miniaturization is also a trend regarding process features. nanoimprint lithography has great potential for its simple process, low cost, mass-production capacity, and ease to produce nanoscale microstructure. After making a fence structure of line width less than 100nm on quartz glass with FIB, this study printed the fence structure of line width less than 100nm with the nanoimprint lithography using PDMS mold and quartz soft mold. Though PDMS molding is fast and convenient, it is uncommon with regard to small-size press. This study investigated the application of PDMS molds to nanoimprint lithography in order to verify the optimal parameters of PDMS molding and the results of nanoimprint lithography with PDMS soft modes. After obtaining the optimal molding press, the optimal molding parameters and press pressure were applied to find the optimal experimental results. Results show that the combination can successfully print a fence structure with a line width of 40nm.
| Identifer | oai:union.ndltd.org:NSYSU/oai:NSYSU:etd-0907109-024812 |
| Date | 07 September 2009 |
| Creators | Yao, Jie-liang |
| Contributors | Yuan-Fang Chou, Chien-Hsiang Chao, Ming- San Lee |
| Publisher | NSYSU |
| Source Sets | NSYSU Electronic Thesis and Dissertation Archive |
| Language | Cholon |
| Detected Language | English |
| Type | text |
| Format | application/pdf |
| Source | http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0907109-024812 |
| Rights | not_available, Copyright information available at source archive |
Page generated in 0.0017 seconds