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A preliminary study on anisotropic polishing behaviors of hydrodynamic polishing process

This study is to investigate that the polishing behavior will be independent of or dependent on the direction of particle motion by the anisotropic polishing phenomenon of hydrodynamic polishing process under the semi-contact lubricating condition. There are two types of experiments to be examined to get to the objectives. First, taking polishing on the work surface which possesses the isotropic surface roughness, to discuss the variation of the smoothing efficiency of the surface irregularities in the five different directions on the work surface. Second, taking three kinds of polishing, ¡§longitudinal, transverse, and oblique roughness polishing¡¨, on the work surface which possesses the anisotropic surface roughness. Then to discuss the variation of the smoothing efficiency of the surface irregularities on the work surface.
Both the results of two types experiments should be take to distinguish
the difference between one smoothing efficiency and the others from
using the hypothesis testing.
All hypothesis tests about the experiment results of the work piece which possesses the isotropic surface roughness are accepting .
But, most hypothesis tests about the experiment results of the work piece which possesses the anisotropic surface roughness are rejecting .
The theory analysis about the smoothing efficiency is discussing. The discussion about the smoothing efficiency can explain the phenomenon due to taking polishing on the work surface which possesses the anisotropic surface roughness. The reason why the phenomenon happened is possible the effects of different lubrication condition. Last, from the lubrication theory, the effects of different lubrication condition due to different surface texture can be employed to verify the explanation about the phenomenon is suitable.
The conclusion from the experiment results and the theory analysis
is: the polishing behavior is possible independent of the direction of particle motion by the anisotropic polishing phenomenon of hydro- dynamic polishing process under the semi-contact lubricating condition.

Identiferoai:union.ndltd.org:NSYSU/oai:NSYSU:etd-0715104-020517
Date15 July 2004
CreatorsChiu, Yi-hung
Contributorsnone, nono, none, Su, Yaw-Terng
PublisherNSYSU
Source SetsNSYSU Electronic Thesis and Dissertation Archive
LanguageCholon
Detected LanguageEnglish
Typetext
Formatapplication/pdf
Sourcehttp://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0715104-020517
Rightsunrestricted, Copyright information available at source archive

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