A procedure to characterize electron-beam resist using a scanning electron microscope and study of process optimization of an electron beam imaging system using experimental design methods /

Description

Thesis (M.S.)--Rochester Institute of Technology, 1992. / Typescript. Includes bibliographical references (leaves 114-116).

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1. http://hdl.handle.net/1850/10912

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Identifer	oai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/26912039
Date	January 1992
Creators	Pyles, Randall C.
Source Sets	OCLC
Language	English
Detected Language	English
Source	Online version of thesis