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The evolution of sub-micron surface topography during the plasma etching of selected materials

No description available.
Identiferoai:union.ndltd.org:bl.uk/oai:ethos.bl.uk:284839
Date January 1998
CreatorsCui, Naiyi
PublisherUniversity of Ulster
Source SetsEthos UK
Detected LanguageEnglish
TypeElectronic Thesis or Dissertation

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