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Novel impurity distributions in GaAs devices by focused ion beam implantation

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1. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.241086

Identifer	oai:union.ndltd.org:bl.uk/oai:ethos.bl.uk:241086
Date	January 1992
Creators	Hussain, Tahir
Publisher	University of Cambridge
Source Sets	Ethos UK
Detected Language	English
Type	Electronic Thesis or Dissertation