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Phosphorous diffusion and hydrogen passivation of polycrystalline silicon for photovoltaic cells.

M.Sc. / Techniques for the fabrication of polycrystalline silicon solar cells have advanced in recent years with efficiencies exceeding 17%. The major advantage of polycrystalline silicon is its low cost relative to single-crystalline silicon. The disadvantage is the significantly smaller minoritycarrier bulk diffusion length and inhomogeneous nature of the material. These two drawbacks are due to the presence of grain boundaries as well as high concentrations of dislocations and other physical and chemical defects. In this study the experimental conditions were determined to fabricate solar cells on polycrystalline silicon substrates. The controlled diffusion of phosphorous into silicon and subsequent evaluation of the doped layers (by spreading resistance profiling and chemical staining) were important aspects of this study. From these results the diffusion parameters (i.e. temperature and reaction times) could be optimized in order to improve the solar cell output parameters. Additional material improvement (increase in surface- and bulk minority carrier lifetimes) was demonstrated by the hydrogen passivation of electrically active defects in polycrystalline silicon. However. measurements on hydrogenated silicon samples also indicated that excess passivation can result in surface damage and subsequent reduction in the minority carrier lifetimes. Preliminary solar cells were fabricated on polycrystalline silicon with efficiencies ranging between 0.5 and 6% (total area = 16 cm2).

Identiferoai:union.ndltd.org:netd.ac.za/oai:union.ndltd.org:uj/uj:8942
Date08 August 2012
Source SetsSouth African National ETD Portal
Detected LanguageEnglish
TypeThesis

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