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Mass spectroscopy of the etching of Si and SiO←2 in CF←4/O←2 plasmas and X-ray photoelectron spectroscopy of plasma deposited borophosphosilicate glasses

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  1. http://ethos.bl.uk/OrderDetails.do?uin=uk.bl.ethos.294220
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541
Additional Fields
Identiferoai:union.ndltd.org:bl.uk/oai:ethos.bl.uk:294220
Date January 1989
CreatorsThomas, David John
PublisherUniversity of Bristol
Source SetsEthos UK
Detected LanguageEnglish
TypeElectronic Thesis or Dissertation

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