Chemical and physical understanding of diffusion barrier layers on semiconductors: (hfac)copper(VTMS) and its ligands on silicon(100)-2 x 1 and titanium carbon nitride-covered silicon

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Thesis (Ph. D.)--University of Delaware, 2006. / Principal faculty advisor: Andrew V. Teplyakov, Dept. of Chemistry & Biochemistry and Raul F. Lobo, Dept. of Chemical Engineering. Includes bibliographical references.

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Identifer	oai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/82461304
Date	January 2006
Creators	Pirolli, Laurent.
Source Sets	OCLC
Language	English
Detected Language	English
Source	Access to citation, abstract and download form provided by ProQuest Information and Learning Company; downloadable PDF file 3.19 Mb., 254 p.