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Electrical characterization of Si-SiO2 interface for thin oxides /

Thesis (Ph. D.)--University of Hong Kong, 1987.

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/52010857
Date January 1987
CreatorsHung, Kwok-kwong.
Publisher[Hong Kong : University of Hong Kong],
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish
SourceView the Table of Contents & Abstract.

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