In this thesis, silicon oxide thin films fabricated on silicon substrates by reactive radio frequency (rf) magnetron sputtering and supercritical CO2 (SCCO2) treatment at room temperature were investigated. The electrical properties including I-V and C-V of the films prepared at different processing conditions were discussed. Using the Transmission Electron Microscope (TEM), the thickness of silicon oxide thin films were measured. The results suggested that the film quality can be significantly improved by the SCCO2 treatment after reactive sputtering. The leakage current of the films at an electrical field of 1 MV/cm is 1¡Ñ10-8A/cm2 with a hysteresis voltage of 0.01V. The silicon oxide thin films can be used as a barrier layer for Al/SiO2/Si silicon solar cells.
The energy conversion efficiency of a single crystal silicon solae cell is 10.2% under AM1.5 (965W/m2) radiation. After rapid thermal annealing(RTA) at 500¢J, the measured short-circuit current, open- circuit voltage, fill factor are 53mA, 0.54V and 0.53, respectively.
| Identifer | oai:union.ndltd.org:NSYSU/oai:NSYSU:etd-0712111-105602 |
| Date | 12 July 2011 |
| Creators | Wei, Ji-Rong |
| Contributors | Yi-Jen Chiu, Jing-Yuan Lin, Fang-Zheng Lin, Ann-Kuo Chu, Ting-Chang Chang |
| Publisher | NSYSU |
| Source Sets | NSYSU Electronic Thesis and Dissertation Archive |
| Language | Cholon |
| Detected Language | English |
| Type | text |
| Format | application/pdf |
| Source | http://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0712111-105602 |
| Rights | not_available, Copyright information available at source archive |
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