A low-temperature (<300°C) method to fabricate electrostatically actuated microelectromechanical (MEM) clamped-clamped beam resonators has been developed. It utilizes an amorphous silicon carbide (SiC) structural layer and a thin polyimide spacer. The resonator beam is constructed by DC sputtering a tri-layer composite of low-stress SiC and aluminum over the thin polyimide sacrificial layer, and is then released using a microwave O 2 plasma etch. Deposition parameters have been optimized to yield low-stress films (<50MPa), in order to minimize the chance of stress-induced buckling or fracture in both the SiC and aluminum. Characterization of the deposited SiC was performed using several different techniques including scanning electron microscopy, EDX and XRD. / Several different clamped-clamped beam resonator designs were successfully fabricated and tested using a custom built vacuum system, with measured frequencies ranging from 5MHz to 25MHz. A novel thermal tuning method is also demonstrated, using integrated heaters directly on the resonant structure to exploit the temperature dependence of the Young's modulus and thermally induced stresses.
| Identifer | oai:union.ndltd.org:LACETR/oai:collectionscanada.gc.ca:QMM.100250 |
| Date | January 2006 |
| Creators | Dusatko, Tomas A. |
| Publisher | McGill University |
| Source Sets | Library and Archives Canada ETDs Repository / Centre d'archives des thèses électroniques de Bibliothèque et Archives Canada |
| Language | English |
| Detected Language | English |
| Type | Electronic Thesis or Dissertation |
| Format | application/pdf |
| Coverage | Master of Engineering (Department of Electrical and Computer Engineering.) |
| Rights | © Tomas A. Dusatko, 2006 |
| Relation | alephsysno: 002769195, proquestno: AAIMR51437, Theses scanned by UMI/ProQuest. |
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