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A study of electrical, optical and structural properties of RF sputtered and ion beam sputtered silicon films

No description available.
Identiferoai:union.ndltd.org:bl.uk/oai:ethos.bl.uk:380853
Date January 1988
CreatorsAwang Mat, A. F.
PublisherUniversity of Reading
Source SetsEthos UK
Detected LanguageEnglish
TypeElectronic Thesis or Dissertation

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