by Leung Kit Sum = 透過X光電子譜研究射頻濺射之銅復合物石英 / 梁潔心. / Thesis submitted in: August 2002. / Thesis (M.Phil.)--Chinese University of Hong Kong, 2003. / Includes bibliographical references (leaves 77-78). / Text in English; abstracts in English and Chinese. / by Leung Kit Sum = Tou guo X guang dian zi pu yan jiu she pin jian she zhi tong fu he wu shi ying / Liang Jiexin. / Abstract --- p.i / 論文摘要 --- p.iii / Acknowledgement --- p.iv / Table of Content --- p.v / List of Figures --- p.ix / List of Tables --- p.xi / Chapter CHAPTER 1 --- INTRODUCTION / Chapter 1.1 --- Nanoparticles and Nanophase Materials --- p.1 / Chapter 1.2 --- Nonlinear Optical Phenomena and Their Physical Origin --- p.4 / Chapter 1.2.1 --- Dielectric Confinement --- p.6 / Chapter 1.2.2 --- Quantum Confinement --- p.8 / Chapter 1.2.2.1 --- Intraband Transition --- p.9 / Chapter 1.2.2.2 --- Interband Transition --- p.9 / Chapter 1.2.2.3 --- Hot-electron Transition --- p.11 / Chapter 1.3 --- Importance of Optical Nonlinearity --- p.11 / Chapter 1.3.1 --- Self-Phase Modulation --- p.11 / Chapter 1.3.2 --- Self-Focusing/Defocusing --- p.12 / Chapter 1.4 --- Sample Preparation --- p.12 / Chapter 1.4.1 --- Sputtering --- p.13 / Chapter 1.5 --- Characterization of Nanocomposites --- p.15 / Chapter 1.6 --- Aim of the Project --- p.15 / References --- p.17 / Chapter CHAPTER 2 --- INSTRUMENTATION / Chapter 2.1 --- Introduction --- p.20 / Chapter 2.2 --- Sputter Deposition --- p.20 / Chapter 2.2.1 --- Glow Discharge --- p.21 / Chapter 2.2.2 --- Radio-Frequency Sputtering (RF Sputtering) --- p.24 / Chapter 2.2.3 --- Magnetically Enhanced Sputtering --- p.24 / Chapter 2.2.4 --- Instrumentation --- p.25 / Chapter 2.2.4.1 --- Target Assemblies --- p.27 / Chapter 2.2.4.2 --- Shutter --- p.28 / Chapter 2.2.4.3 --- Substrate Holder --- p.28 / Chapter 2.2.4.4 --- Power Supply --- p.28 / Chapter 2.2.5 --- Experimental --- p.29 / Chapter 2.3 --- X-ray Photoelectron Spectroscopy (XPS) --- p.29 / Chapter 2.3.1 --- Instrumentation --- p.31 / Chapter 2.3.2 --- Application to metal nanoclusters composite glass --- p.33 / Chapter 2.3.2.1 --- Compositional Analysis --- p.33 / Chapter 2.3.2.2 --- Depth Profiling --- p.33 / Chapter 2.3.3.3 --- Auger Parameters --- p.33 / Chapter 2.4 --- Transmission Electron Microscopy (TEM) --- p.34 / Chapter 2.4.1 --- Sample Preparation --- p.35 / Chapter 2.4.1.1 --- Sample Thickness Determination --- p.35 / Chapter 2.4.1.2 --- Ion Milling --- p.36 / Chapter 2.4.2 --- Instrumentation --- p.36 / Chapter 2.4.3 --- Contrast and Image Formation --- p.38 / Chapter 2.4.3.1 --- Bright and Dark Field Image --- p.38 / Chapter 2.4.3.2 --- Mass and Thickness Contrast --- p.40 / Chapter 2.4.3.3 --- Diffraction Contrast --- p.40 / References --- p.42 / Chapter CHAPTER 3 --- COMPOSITION AND NANUSTRUCTURE OF COPPER DOPED FUSED SILICA / Chapter 3.1 --- Introduction --- p.44 / Chapter 3.2 --- Experiment --- p.45 / Chapter 3.3 --- Results and Discussion --- p.47 / Chapter 3.3.1 --- Effect of Input RF Power on the Growth of Film --- p.47 / Chapter 3.3.2 --- Theoretical Calculation of Cluster Size by Ratio of Surface to Total Amount of Copper --- p.55 / Chapter 3.3.3 --- TEM Studies of Copper Nanoclusters --- p.57 / Chapter 3.3.4 --- Further Discussion: Effect of Current and Voltage on the Determination of Deposition Rate --- p.60 / Chapter 3.3.5 --- Atomic Distribution and Chemical State of Copper Nanocluster --- p.60 / Chapter 3.3.6 --- Effect of Pressure on the Growth of Film --- p.66 / Chapter 3.3.6.1 --- How Pressure Affects Cluster Growth --- p.70 / Chapter 3.3.7 --- Effect of Deposition time on the Growth of Film --- p.71 / Chapter 3.3.7.1 --- How Film thickness Affects Cluster Growth --- p.75 / Chapter 3.4 --- Summary --- p.75 / References --- p.77 / Chapter Chapter 4 --- CONCLUSION AND FUTURE DIRECTIONS / Chapter 4.1 --- Conclusion --- p.79 / Chapter 4.2 --- Future Directions --- p.79 / Chapter 4.2.1 --- Generation of Active Matrix Nanocomposite --- p.79
| Identifer | oai:union.ndltd.org:cuhk.edu.hk/oai:cuhk-dr:cuhk_324470 |
| Date | January 2003 |
| Contributors | Leung, Kit Sum., Chinese University of Hong Kong Graduate School. Division of Chemistry. |
| Source Sets | The Chinese University of Hong Kong |
| Language | English, Chinese |
| Detected Language | English |
| Type | Text, bibliography |
| Format | print, xi, 80 leaves : ill. ; 30 cm. |
| Rights | Use of this resource is governed by the terms and conditions of the Creative Commons “Attribution-NonCommercial-NoDerivatives 4.0 International” License (http://creativecommons.org/licenses/by-nc-nd/4.0/) |
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