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The Influence of Plasma Treatment on Microstructure and Surface Properties of CrxNy, DLC and TiO2 Thin Films

This thesis is to study the microstructure and its related surface properties of CrxNy¡BDLC and TiO2 films prepared by different plasma energy processes such as physical vapor deposition (PVD) and plasma immersion ion implantation (PIII) processes.
In the first chapter of this thesis, the different Cr-based coatings (Cr, Cr2N and CrN) were prepared by PVD process with lower plasma energy condition (less than 100 eV). The surface energy properties of these Cr-based coating were studied and the relationship between the surface properties and adhesion forces with respect to epoxy molding compound (EMC) were also investigated. It is found that the PVD-Cr2N coating has the largest contact angle of water and the lowest polar components and surface energy. The low surface energy is attributed to the high density of surface reactive sites and the formation of N-H bonds and O-H bonds on the film surface that act as the effective adsorption sites for carbon.
The second chapter focuses on the modification of the electrical and mechanical properties of DLC films with high plasma energy (5¡ã45 keV) , PIII post-treatment. It is found that using high ion energy and a short treating time can modify the sp3 content, the nano-hardness and the Young¡¦s modulus of the DLC films. The formation mechanisms of sp3 C-C bonds in the implanted DLC film involve the reaction among compressive stress field, bonds breakage and recombination process induced by hydrogen and carbon ion.
The third chapter deals with the structure and photocatalytic properties of nitrogen-doped TiO2 film prepared by PVD process with lower plasma energy condition (less than 100 eV). The TiO2-xNx films are indirect transition type and optical band gap energy is various with increasing nitrogen flow rate. The TiO2-xNx film with high crystallinity and porous surface morphology shows the best degradation rate of methylene blue solution.

Identiferoai:union.ndltd.org:NSYSU/oai:NSYSU:etd-0620106-225448
Date20 June 2006
CreatorsChiu, Sung-mao
ContributorsKer-chang Hsieh, Dershin Gan, Pouyan Shen
PublisherNSYSU
Source SetsNSYSU Electronic Thesis and Dissertation Archive
LanguageEnglish
Detected LanguageEnglish
Typetext
Formatapplication/pdf
Sourcehttp://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0620106-225448
Rightsrestricted, Copyright information available at source archive

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