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Photoluminescence Properties of InGaN/GaN Heterostructures Grown on Silicon Substrates

In this thesis, we study the structural and optical properties of GaN-based material structures grown on silicon substrates by temperature-dependent Photoluminescence (PL)¡BRaman¡BXRD and
time-resolved PL measurements.
In non-intentionally doped GaN structure, various excitonic transitions near band edge are observed and identified. We estimate the stress of the GaN samples to be 0.671 Gpa and 0.57 Gpa by using the energy shift of neutral-donor-bound exciton transitions. This is consistent with our Raman
measurements.
According to the XRD patterns, the length of InGaN/GaN multiple quantum wells in samples D¡BE¡BF are 43.83 nm¡B65 nm and 68.27 nm. In these samples, multiple PL peaks at low temperatures are observed. Carrier
recombination lifetime have been measured as well.

Identiferoai:union.ndltd.org:NSYSU/oai:NSYSU:etd-0803105-175302
Date03 August 2005
CreatorsHuang, Chi-huang
Contributorsnone, Ming-Chi Chou, none
PublisherNSYSU
Source SetsNSYSU Electronic Thesis and Dissertation Archive
LanguageCholon
Detected LanguageEnglish
Typetext
Formatapplication/pdf
Sourcehttp://etd.lib.nsysu.edu.tw/ETD-db/ETD-search/view_etd?URN=etd-0803105-175302
Rightscampus_withheld, Copyright information available at source archive

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