Ng, Chi Hai Alvin. / Thesis submitted in: December 2002. / Thesis (M.Phil.)--Chinese University of Hong Kong, 2003. / Includes bibliographical references. / Abstracts in English and Chinese. / Abstract --- p.i / Acknowledgement --- p.iv / Table of Contents --- p.v / List of Figure Captions --- p.ix / List of Table Captions --- p.xx / Chapter Chapter 1 --- Introduction --- p.1 / Chapter 1.1 --- Silicon Crystal Structure --- p.1 / Chapter 1.2 --- Silicon Dioxide Structure --- p.2 / Chapter 1.3 --- Wafer Cleaning of Silicon --- p.3 / Chapter 1.3.1 --- Sources of Contamination --- p.4 / Chapter 1.3.2 --- Traditional Approach of Wafer Cleaning --- p.5 / Chapter 1.3.3 --- Recent Developments in Wafer Cleaning --- p.6 / Chapter 1.3.3.1 --- Particles --- p.6 / Chapter 1.3.3.2 --- Metal Contamination --- p.7 / Chapter 1.3.3.3 --- Organic Contamination --- p.9 / Chapter 1.3.3.4 --- Surface Microroughness --- p.9 / Chapter 1.3.3.5 --- Native Oxide --- p.11 / Chapter 1.4 --- Oxidation of Silicon --- p.13 / Chapter 1.4.1 --- The Initial Oxidation Regime --- p.17 / Chapter 1.5 --- Current Status of MOS Structure --- p.19 / Chapter 1.5.1 --- Wafer Cleaning --- p.19 / Chapter 1.5.2 --- Silicon Oxidation --- p.20 / Chapter 1.5.3 --- Ozone Oxidation --- p.24 / Chapter 1.5.4 --- High-k Dielectrics --- p.26 / Chapter 1.5.4.1 --- Silicon Oxynitride --- p.27 / Chapter 1.5.4.2 --- Hafnium Oxide and Zirconium Oxide --- p.28 / Chapter 1.5.5 --- Single Monolayer Oxide of Silicon --- p.32 / Chapter 1.6 --- Oxidation by Conventional Furnace --- p.36 / Chapter 1.7 --- Oxidation by RTO --- p.37 / Chapter 1.7.1 --- Equipment Issues --- p.38 / Chapter 1.8 --- Radiation Effects --- p.38 / Chapter 1.8.1 --- Radiation Effects on Ultrathin Gate Oxides --- p.45 / Reference --- p.45 / Chapter Chapter 2 --- Preparation and Characterization Techniques --- p.48 / Chapter 2.1 --- Conventional Furnace --- p.48 / Chapter 2.2 --- Rapid Thermal Oxidation (RTO) --- p.48 / Chapter 2.3 --- Irradiation Source --- p.49 / Chapter 2.4 --- Capacitance-Voltage (C-V) and Current-Voltage (I-V) Curves --- p.51 / Chapter 2.4.1 --- Definition of Potential and Sign Conventions --- p.51 / Chapter 2.4.2 --- The Poisson Equation --- p.55 / Chapter 2.4.3 --- Low Frequency Capacitance --- p.58 / Chapter 2.4.3.1 --- Sum of Series Capacitors --- p.58 / Chapter 2.4.3.2 --- Discussion of Various Terms Contributing to the Field --- p.60 / Chapter 2.4.3.3 --- Calculation of the Low Frequency Capacitance --- p.62 / Chapter 2.4.3.4 --- "Simpler Forms of Capacitancein Accumulation, at Flatband, in Depletion and Inversion" --- p.63 / Chapter 2.4.4 --- High Frequency C-V Curves --- p.65 / Chapter 2.4.5 --- Experimental Setups --- p.66 / Chapter 2.5 --- Conductance-Voltage (G-V) Characterization --- p.67 / Chapter 2.5.1 --- Experimental Details --- p.68 / Chapter 2.6 --- Ellipsometry --- p.69 / Chapter 2.7 --- Rutherford Backscattering Spectrometry --- p.71 / Chapter 2.7.1 --- Experimental Setup --- p.72 / Reference --- p.72 / Chapter Chapter 3 --- Annealing Effects of Conventional Furnace Grown Oxide --- p.74 / Chapter 3.1 --- Experiment --- p.74 / Chapter 3.2 --- Results --- p.74 / Chapter 3.3 --- Conclusions --- p.85 / Reference --- p.86 / Chapter Chapter 4 --- Rapid Thermal Oxidation of MOS Capacitors --- p.87 / Chapter 4.1 --- Experiment --- p.87 / Chapter 4.2 --- Results and Discussions --- p.90 / Chapter 4.3 --- Conclusions --- p.114 / Reference --- p.115 / Chapter Chapter 5 --- Ionizing Radiation on MOS Capacitors --- p.117 / Chapter 5.1 --- Experimental Setup --- p.117 / Chapter 5.2 --- Results and Discussions --- p.120 / Chapter 5.3 --- Conclusions --- p.149 / Reference --- p.151 / Chapter Chapter 6 --- Conclusions --- p.153 / Chapter 6.1 --- Summary --- p.153 / Chapter 6.2 --- Future Work --- p.155 / Reference --- p.157
| Identifer | oai:union.ndltd.org:cuhk.edu.hk/oai:cuhk-dr:cuhk_324385 |
| Date | January 2003 |
| Contributors | Ng, Chi Hai Alvin., Chinese University of Hong Kong Graduate School. Division of Electronic Engineering. |
| Source Sets | The Chinese University of Hong Kong |
| Language | English, Chinese |
| Detected Language | English |
| Type | Text, bibliography |
| Format | print, xxi, 157 leaves : ill. ; 30 cm. |
| Rights | Use of this resource is governed by the terms and conditions of the Creative Commons “Attribution-NonCommercial-NoDerivatives 4.0 International” License (http://creativecommons.org/licenses/by-nc-nd/4.0/) |
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