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Characterization of ta-C film prepared by pulsed filtered vacuum arc deposition system.

Lau Wing Fai. / Thesis (M.Phil.)--Chinese University of Hong Kong, 2000. / Includes bibliographical references (leaves 101-105). / Abstracts in English and Chinese. / Abstract --- p.i / Abstract (Chinese version) --- p.iii / Acknowledgement --- p.iv / Content --- p.v / List of figure caption --- p.vii / List of table caption --- p.xi / Chapter Chapter 1 --- Introduction / Chapter 1.1 --- Nomenclature --- p.1 / Chapter 1.2 --- Comparison of diamond and DLC --- p.2 / Chapter 1.3 --- Comparison of the amorphous hydrogenated and hydrogen free amorphous carbon --- p.4 / Chapter 1.4 --- Application of DLC --- p.7 / Chapter 1.5 --- ta-C growth mechanism --- p.9 / Chapter 1.6 --- Recent activities on ta-C films --- p.11 / Chapter 1.7 --- Goal of this project and organization of this thesis --- p.11 / Chapter Chapter 2 --- Deposition of ta-C films / Chapter 2.1 --- Ta-C film deposition systems --- p.12 / Chapter 2.1.1 --- Direct ion beam deposition --- p.13 / Chapter 2.1.2 --- Laser ablation --- p.14 / Chapter 2.1.3 --- Mass selected ion beam deposition (MSIBD) --- p.15 / Chapter 2.1.4 --- Arc discharge and filtered arc discharge (FAD) methods --- p.16 / Chapter 2.2 --- The pulsed filtered vacuum arc deposition system --- p.18 / Chapter 2.2.1 --- Working principle --- p.18 / Chapter 2.2.2 --- Film thickness control --- p.20 / Chapter 2.3 --- System modification --- p.22 / Chapter 2.3.1 --- Cathode erosion improvement --- p.22 / Chapter 2.3.2 --- Enhancement of stabilization of the cathodic arc --- p.23 / Chapter 2.4 --- Sample preparation --- p.24 / Chapter 2.4.1 --- Film deposition --- p.24 / Chapter 2.4.2 --- Thermal treatments --- p.24 / Chapter Chapter 3 --- Characterization methods / Chapter 3.1 --- Raman spectroscopy --- p.25 / Chapter 3.2 --- IR Photoelasticity (PE) --- p.27 / Chapter 3.2.1 --- Basic principle --- p.27 / Chapter 3.2.2 --- Senarmont method --- p.30 / Chapter 3.3 --- Ellipsometry --- p.33 / Chapter 3.3.1 --- Principle of ellipsometry --- p.33 / Chapter 3.3.2 --- Mathematical representation --- p.37 / Chapter 3.3.2a --- Bulk layer --- p.37 / Chapter 3.3.2b --- Single layer structure --- p.38 / Chapter 3.3.3 --- Spetroscopioc rotating analyzer ellipsometer --- p.39 / Chapter 3.3.4 --- Analysis method --- p.42 / Chapter 3.3.5 --- Forouhi and Bloomer (F.B.) model --- p.43 / Chapter 3.4 --- Tribology --- p.44 / Chapter 3.4.1 --- The definition of friction --- p.44 / Chapter 3.4.2 --- Tribometer --- p.46 / Chapter Chapter 4 --- Results / Chapter 4.1 --- As-deposited samples --- p.47 / Chapter 4.1.1 --- Sp3 fraction --- p.47 / Chapter 4.1.2 --- Stress --- p.52 / Chapter 4.1.3 --- Optical properties --- p.57 / Chapter 4.1.3.1 --- Optical model for ta-C film --- p.57 / Chapter 4.1.3.2 --- Figure of merit --- p.59 / Chapter 4.1.3.3 --- Result and discussion --- p.59 / Chapter 4.1.4 --- Mechanical properties --- p.70 / Chapter 4.1.4.1 --- Hardness --- p.70 / Chapter 4.1.4.2 --- Friction --- p.76 / Chapter 4.2 --- Annealed samples --- p.81 / Chapter 4.2.1 --- Thermal stability of the ta-C film --- p.81 / Chapter 4.2.2 --- Stress relaxation --- p.85 / Chapter 4.2.3 --- Stress and G peak shift --- p.92 / Chapter Chapter 5 --- Future work / Chapter 5.1 --- Film roughness and thickness profile improvement --- p.95 / Chapter 5.2 --- Pulsed substrate bias --- p.97 / Chapter 5.3 --- Field emission and doping possibility --- p.97 / Chapter Chapter 6 --- Conclusion --- p.98 / Reference --- p.101 / Conference / publications --- p.105

Identiferoai:union.ndltd.org:cuhk.edu.hk/oai:cuhk-dr:cuhk_323201
Date January 2000
ContributorsLau, Wing Fai., Chinese University of Hong Kong Graduate School. Division of Electronic Engineering.
Source SetsThe Chinese University of Hong Kong
LanguageEnglish, Chinese
Detected LanguageEnglish
TypeText, bibliography
Formatprint, xi, 105 leaves : ill. (some col.) ; 30 cm.
RightsUse of this resource is governed by the terms and conditions of the Creative Commons “Attribution-NonCommercial-NoDerivatives 4.0 International” License (http://creativecommons.org/licenses/by-nc-nd/4.0/)

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