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Mechanical and electrical properties of nickel-aluminium thin films /

Thesis (Ph. D.)--University of Hong Kong, 2000. / Includes bibliographical references.

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/51344076
Date January 2000
CreatorsNg, Hoi-pang.
PublisherHong Kong : University of Hong Kong,
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish
SourceView the Table of Contents & Abstract.

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