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In situ infrared spectroscopy study of atomic layer deposition of high-kappa metal oxide and metal on passivated silicon surfaces

Thesis (Ph. D.)--Rutgers University, 2008. / "Graduate Program in Physics and Astronomy." Includes bibliographical references.

Identiferoai:union.ndltd.org:OCLC/oai:xtcat.oclc.org:OCLCNo/430652334
Date January 2008
CreatorsDai, Min.
Source SetsOCLC
LanguageEnglish
Detected LanguageEnglish

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